Mask testing
R&S
®
RTE
431User Manual 1326.1032.02 ─ 20
Used reference
Sets the reference waveform from which the mask is created.
The reference waveform can be created before with "Reference Waveform Setup", or
loaded from a file in the lower part of the dialog box. If the reference waveform was not
defined before mask definition, it is created automatically from the mask test "Source"
waveform.
Remote command:
MTESt:REFWfm on page 1341
Horizontal width
Sets the width of the mask in horizontal direction. The specified number of divisions is
added to the positive x-values and subtracted from the negative x-values of the mask
limits in relation to the source waveform of the mask. The overall mask width is twice
the specified horizontal width.
Figure 10-2: Waveform mask with horizontal width = 0.2 div
Remote command:
MTESt:WFMRescale:XWIDth on page 1342
Vertical width
Sets the width of the waveform mask in vertical direction. The specified number of divi-
sions is added to the y-values of the upper mask limit and subtracted from the y-values
of the lower mask limit. Thus, the upper half of the mask is pulled upwards, the lower
half is pulled down, and the overall height of the mask is twice the vertical width.
Figure 10-3: Waveform mask with vertical width = 0.5 div
Remote command:
MTESt:WFMRescale:YWIDth on page 1342
Mask test settings
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