EasyManua.ls Logo

Heidelberg Engineering MLA 150 - Page 12

Default Icon
25 pages
Print Icon
To Next Page IconTo Next Page
To Next Page IconTo Next Page
To Previous Page IconTo Previous Page
To Previous Page IconTo Previous Page
Loading...
12
1) Standard
a) Set a dose and focus according to
the Resist Table (Desktop) or from
your own experience
b) The design can be tilted based on
the rotation of your substrate
measured by the machine
c) Enable the exposition of bitmaps
you set previously
d) Delay the exposure [hour:minutes]
e) Auto-unload the substrate if you
want to expose only one layer
Be aware that MLA-1 and MLA-2 have
different Resist Tables