g) Set a dose and focus according
to the Resist Table (Desktop) or
from your own experience
h) Define which correction based
on alignment you want to apply
i) Enable the exposition of
bitmaps you set previously
j) Delay the exposure
[hour:minutes]
k) Auto-unload the substrate if you
want to expose only one layer
Be aware that MLA-1 and MLA-2 have
different Resist Tables
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