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Park Systems XE-100 User Manual

Park Systems XE-100
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Park XE-100 AFM User Manual
Ed Fei and Ryan Brock
Updated 10/30/13
NOTE: This document is intended as a quick reference for basic operation of the
Park XE-100 and is by no means a comprehensive manual. It is strongly suggested
that users look through the Park documentation. The better you understand the
instrument, the more effectively you will be able to use it. This device is highly
similar to the Park XE-70. Differences have been highlighted in green.
Basic AFM Principles
When the tip is suspended in air, the laser will hit the center of the quadrant photodetector.
If the tip encounters a feature on the surface, the tip deflects and the laser will move on the
quadrant photodetector. This is relayed to a motor controlling the tip which adjusts the tip’s
vertical position until the laser is aimed in the center of the quadrant photodetector once again.
Effectively, this keeps the tip at a constant distance from the sample surface. By recording the
position of the motor height, we can now know the topography of the sample surface.
The tips provided in this lab are intended for ‘non-contact’ AFM, which is similar in principle to
what is described above. Rather than relying on physical contact with the surface, the
cantilever/tip is oscillated at a given frequency above the sample surface, and interactive forces
from the surface lead to changes in the amplitude/phase of this oscillation.
Setting up the AFM is simple: adjust the mirrors until the light path follows the diagram below
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Park Systems XE-100 Specifications

General IconGeneral
TypeAtomic Force Microscope (AFM)
Max Scan Area100 μm x 100 μm
Z Range12 μm
Resolution0.1 nm
XY Scan Range100 μm x 100 μm
Z Scan Range12 μm
Maximum Sample Size200 mm diameter, 20 mm height

Summary

Basic AFM Principles

Login To Badger, Enable Device

Hardware Setup

Instructions for physically setting up the AFM instrument.

Aim Laser on End of Cantilever (Adjust Mirror 1)

Aim Laser on Center of Photodetector (Adjust Mirror 2)

Mode, Scanner, and Frequency Selection

Initial Surface Approach

Z-scanner troubleshooting

Guidance for resolving issues during the initial surface approach.

Optimize Scan Parameters

Collect Image

Modify with XEI

Using XEI software for image analysis and modification.

Flattening your sample

Technique to correct for sample tilt or curvature in images.

Shut down

XE-100 AFM Order of Operations

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