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Temescal BJD-1800 - User Manual

Temescal BJD-1800
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Temescal BJD-1800 Ebeam Evaporator (1) Operation
Procedure
When you approach the system check that the cryo pump temperature is 20K or less
If the cryo temperature is above 20K, do not use. Notify Nano3 staff.
The system should be left in high vacuum when not in use. If the system was not left in high
vacuum by the previous user you may proceed with your deposition but note that depending on
how long the system was left in roughing, the pump-down time may be longer than usual due to
mechanical pump oil back streaming into the chamber. Always remember to leave the system in
high vacuum!
Before you begin the process you must start your log book entry. Please write down your name,
date and the material you intend to evaporate on the log sheet.
Sample Loading Instructions:
1. Close the “High vac” valve.
2. Open the “Vent” valve. It will take approximately three minutes for the chamber to
reach atmospheric pressure.
3. Open the chamber lid and close the “Vent” valve.
4. Check that the glass slide mounted over the view port is clear. If not, replace it with a
new one.
5. Remove the sample holder.
6. If you need to deposit a metal other than one of those that is already in the chamber,
remove one of the crucibles and replace it with the desired material. The name of the
material contained in each crucible is scribed on the bottom of the crucible.
7. If the metal is getting low add more pellets. If the gold is getting low notify Nano3
staff.
8. Check the thickness monitor crystal usage (See the “I/C5 Deposition Controller”
segment of this operation procedure) Replace the crystal if necessary.
9. Place the sample holder and samples back in the chamber.
10. Check the chamber O-ring, make sure it is seated properly.
11. Close the chamber lid.
12. Record the load time on the log sheet.
Pump-down:
1. Turn on the Mechanical Pump by switching the breaker to the on position.
2. Open the “Roughing” valve.
3. Wait till the pressure reaches 50mT or less.
4. Close the “Roughing” valve. Allow a few seconds to insure that the valve is
completely shut.
5. Open the “High Vac” valve.
6. Wait till the pressure reaches 1.0e-6T or less.
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Summary

Sample Loading Instructions

Initial Valve Operations and Venting

Close 'High vac' valve, open 'Vent' valve to reach atmospheric pressure, then open chamber lid and close 'Vent' valve.

Sample Holder and Crucible Preparation

Remove sample holder, replace crucibles if needed, add pellets if low, and check thickness monitor crystal.

Chamber Sealing and Load Time Logging

Place sample holder, check O-ring, close chamber lid, and record the load time on the log sheet.

Pump-down Procedure

Roughing Pump Stage

Turn on mechanical pump, open 'Roughing' valve, and wait for pressure to reach 50mT or less.

High Vacuum Pump Stage

Close 'Roughing' valve, open 'High Vac' valve, and wait for pressure to reach 1.0e-6T or less.

Base Pressure Recording

Allow pumping time to reach 2.0e-6T or less and record the base pressure on the log sheet.

I;C5 Deposition Controller Operation

Crystal Usage Check

Check crystal conductivity ('ACT' column) and age ('Life' column) for replacement needs.

Process Selection

Navigate the 'Process Directory' to select the desired material and press 'Select Active Process'.

Zero Thickness Setting

Press 'Zero Thickness' and ensure no other settings are changed on the controller.

Evaporation Deposition Process

System Power-Up and Initial Settings

Turn on main power, interlock key, set sweep dials to zero, and frequencies to 1.

High Voltage and Filament Activation

Press 'HV On', ensure correct metal, set emission control to zero, then press 'Gun 1 Fil On'.

Emission Control and Beam Observation

Slowly increase emission control, observing for the beam hitting the metal in the crucible.

Deposition Rate Control and Logging

Adjust emission control to maintain rate (max 5nm/s) and record deposition rate and pressure.

Final Thickness and Process Shutdown

Close shutter upon reaching thickness, decrease emission control, turn off filament and HV, power down.

Beam Position and Sweep Settings

Initial Beam Position Adjustment

Set sweep knobs to zero, verify beam hits crucible center, and adjust position knobs if needed.

Sweep Knob and Frequency Adjustment

Adjust longitudinal sweep knob for full surface coverage and set frequencies to 9.

Sample Unloading Procedure

Chamber Venting and Opening

Close 'High Vac' valve, open 'Vent' valve to vent chamber, then open the chamber.

Sample Removal and Preparation

Remove samples, verify crucible contents, replace view port slide, and check O-ring.

Post-Unloading Pump-down and Shutdown

Close chamber lid, rough pump, open 'High Vac', turn off mechanical pump, and log comments.

Temescal BJD-1800 Specifications

General IconGeneral
ModelBJD-1800
CategoryIndustrial Equipment
ManufacturerTemescal
Source TypeElectron Beam
Number of Sources4
System TypeE-Beam Evaporator
Ultimate Vacuum5x10^-7 Torr