Job layers
→ Each layer is determined by : design + laser
parameters for the exposition (Dose and focus are
set later in the process)
→ Each lithography step of your process flow can be
represented by a layer (In this case save your job
and reload it [see slide 5] when performing further
steps)
→ You can add, copy or delete layers
→ It exist 2 types of layer :
- First Exposure = no alignment
-
Job parameters
Laser : choose between 375nm and 405nm
according to recommendation
Laser power : 100% (filter is used for Greyscale)
Design : Choose from the list of converted design
→ See Chapter 2 to convert your design
Exposure bitmaps : to add extra bitmaps image to
be exposed in specific positions
Resist :
1 - LargeDefoc = to extend focus range
from [-10;10] to [-25;25] → used with 20 to
100um thick resist
HAR (High Aspect Ratio) : increase the depth of
focus → require higher dose
Large → for 100 to 300um thick resist
X-Large → for >300um thick resist
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