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Oxford Plasmalab 80 Plus User Manual
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NANOSYSTEM
FABRICATION
FACILITY
(NFF),
HKUST
V
ersion
1.0
Pa
g
e
1
of
24
Standard Operating Manual
___________________________________________________________
Oxford Plasmalab 80 Plus Plasma Etcher
2
Table of Contents
Table of Contents
2
Picture and Location
3
Process Capabilities
3
Cleanliness Standard
3
Available Etching Materials
4
Performance of the Oxford Plasmalab 80 Plus Plasma Etcher
4
Contact List and How to Become a Qualified User
5
Emergency Responses and Communications
5
Training to Become a Qualified User
5
Operating Procedures
5
System Description
5
Safety Warnings
11
Initial System Checks
12
Status Checks
13
Venting the Chamber (before Loading Wafers)
13
Opening the Process Chamber
14
Load Wafers
15
Closing the Process Chamber
15
Pumping down the System for Dry Etching
15
Start Your Dry Etching Process
16
Venting the Chamber (before Unloading Wafers)
19
Pumping the System down for Idle
19
Appendix
21
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Oxford Plasmalab 80 Plus Specifications
General
Brand
Oxford
Model
Plasmalab 80 Plus
Category
Laboratory Equipment
Language
English
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