POWSRWASHER___
4.4 USE OF CLEANING CHEMICALS
CAUTION: _/ and //ushw#hcle_; water
CAU_ON the rese_o/t_o/br d_micJs use_
1 Remove the pbg reservoir (_)present on the beck
a_ fhe machine [Fig. 91
d_ners ca_tdng acids,
3 Move main coilor _ the ow-pressure posit_on by
completdy rotating collar caunterclockw&e. The
chemicalwill automatically be mix_ wi_ _÷ water
and discharged through the nozzie.
NOTE: WHEN THE ADJUSTABLE NOZZLE I$
MOVED TO THE HIGH PRESSURE POSITION,
CHEMICAL WILL NOT BE DISCHARGED.
4.4 USO DE PRODUCTOS QUJMICOS
CUIDADO: use tan solo pfoduc/os
quim_os es_i/Rcos pare m_u_ha _ la _
_ar a _s/dv_
CUIDADO: /lmp;e con ague c/arJ?_ada
A_NC|ON e/es/anque /uego de t_aber uh_//zado
proc/uctoS quire/cos
l Re_ireel tap6e dd esta_que (11 que se encuen_ra
en ia porte trasera de Jam6qulna (Fig_9)
2
de Io _quiJJa.
NOTA: CUANDO _ B_ILLA _tJSTAE_ SE
COLOCA EN _ PqSICION _ ALTA PRES_N,
EL_ODUCTO QULMICO _ SERAASPI_
DESDE SU ESTANQUE.
4. S CLEANING TECHNIQUES
When cloning wi_ _e pressurewashen some cl_nlng
taskscan be so_vedwi_ ,Paler obne, but for most_sks it
isadvan_geous _ u_ a detergenL A defergen_ensures
a quick _king d the di4 dtawing the high pressure
water _ _ne_rate and remove _e did more e_-divdy
The low p_essure posltion provldes a gentle appl_cr._iae
d: chemicals.
This posiiion, is also recommended to rinse a s_dace
after wax appilcatlon or for o_er applications which
r_uire _helow pressure of o garden _se Low pressure
is the equivalent o_ e garden hose set at _he Jowes_
output to properJy appJy chemical. FOR CHEMICAL
APPLICATION, TURN COLLAR ACCORDING TO
SECTION N2.
4.5 T_CNICA$ DE LIMPIEZA
ESPECiFICA EN LA SECCiON 4.2.
1_8
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