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Labconco CentriVap 7812010 - Page 16

Labconco CentriVap 7812010
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Chapter 3: Getting Started
Product Service 1-800-522-7658
12
Acids
Bases Solvents
Bases Solvents
COMPONENT MATERIAL
Acetic Acid 20%
Boric Acid
Hydrobromic Acid 20%
Hydrochloric Acid 20%
Sulfuric Acid 10%
Trifluoroacetic Acid (TFA)
Acetone
Acetonitrile
Dimethyl Formamide
Dimethyl Sulfoxide (DMSO)
Ethyl Acetate
Isoproponal
Methanol
Methyl t-Butyl Ether (MTBE)
Toluene
Standard
CentriVap
Lid Acrylic C D C D D D D C D D C D D
Bearings High Carbon Steel D D D D D D D D D D D
Lid Gasket EPDM D D D D D C C D
Rotor Shaft Stainless Steel D D D
Valve Stainless Steel D D D
O Rings Viton (Fluorocarbon) C C C D C
Fittings Polypropylene D C
Rotor Anodized Aluminum D D
Rotor Hub Acetal (Delrin) C C C D D D C D C
Tubing PVC D C D D D D D D D C D D D D
Acid Resistant
CentriVap
Chamber Teflon coated Aluminum
Lid Glass
Bearings Stainless Steel D D D
Lid Gasket EPDM D D D D D C C D
Rotor Shaft Hastelloy
Valve Teflon D
O Rings Viton (Fluorocarbon) C C C D C
Fittings Polypropylene D C
Rotor Teflon coated Aluminum
Rotor Hub Polypropylene D C
Tubing PVC D C D D D D D D D C D D D D
Cold Trap -50°C
Chamber Stainless Steel D D D
Lid Acrylic C D C D D D D C D D C D D
Cold Trap Gasket Neoprene D D C D D C D D D D D C D
Cold Trap -84°C
& -105°C
Chamber Stainless Steel D D D
Lid Stainless Steel D D D
Cold Trap Gasket Neoprene D D C D D C D D D D D C D
C- Moderate Degradation- Questionable use
D- Severe Degradation- Infrequent use recommended- immediate thorough cleaning required
Epoxy coated Aluminum
Chamber
D
D
If a rotary vane vacuum pump is used, most compounds used in the
CentriVap will degrade the oil if allowed to enter to pump. Frequent oil
changes are required.
Diaphragm vacuum pumps sold by Labconco have wetted parts either made
from PTFE or protected by PTFE coatings and are suitable for nearly all
procedures.
When using compounds in the CentriVap that are hostile to the materials of
construction, it is imperative that the equipment is appropriately maintained.
After each run, clean up all residues, spills and materials that might have
splashed in the chamber using agents suitable for the substance involved.

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