8
Verify Facilities
The following is a check list of recommended facilities and components
required to install and operate the ion source with the HCES.
• Vacuum System – The process chamber’s low pressure vac-
uum system must be capable of base-pressures of 1.33 x 10
-2
Pa (1.0 x10
-4
Torr) or less, with sufficient vacuum pumping
capacity to maintain operating pressure between 0.67 and
1.33 x10
-1
Pa (0.5 and 1.0 x10
-3
Torr) for the maximum gas
flow listed in the “Specifications” on page 63. This corre-
sponds to a approximate vacuum pumping capacity of at least
700
/sec.
• Gas Supply and Control – The source has been tested for
argon operation; it will operate with other inert gases, as well
as oxygen and nitrogen. Refer to “Facilities Requirements”
on page 64 for detailed information. Each source and HCES
requires a separate MFC, which is provided by Veeco when
the source is purchased as a part of a package. It is recom-
mended that the customer install a two stage regulator
upstream of the MFC and a positive shut off valve down-
stream for each MFC.The HCES is designed for inert gas
operation only.
• Cooling – The ion source is fluid cooled, and the HCES is
radiation cooled. Refer to “Facilities Requirements” on
page 64 for additional information.
Ion source surfaces may exceed 300°C (570°F) after use and venting.
Avoid burns during servicing by using appropriate personal protec-
tive equipment and allowing for a sufficient cool down interval.
• Electrical – The Veeco Mark series Controller provides the
currents, voltages and gas flow control needed for source/
HCES operation, and is provided by Veeco when the source
is purchased as a part of a package. Refer to the controller
technical manual for installation, connection and operational
information.
• Mechanical – These items are customer supplied unless
noted:
•
a
1
/
8 in. OD stainless steel gas delivery tube that is clean
of all contaminants and is appropriately rated for vacuum
service within the intended process environment.
• Vacuum/process suitable hardware and bracketry to make
a fixture that secures the ion source base plate to the pro-
cess chamber. This fixture must capably bear the ion
source and HCES's weight. Refer to “Specifications” on
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