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Siemens SINUMERIK ONE MCP 2400.4c User Manual

Siemens SINUMERIK ONE MCP 2400.4c
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L1 Approach length
L2 Retraction length
R1 Approach radius
R2 Retraction radius
Figure 10-9 Approach and retraction along straight line, quadrant and semi-circle
Approach/retraction strategy
You can choose between planar approach/retraction and spatial approach/retraction:
Planar approach:
Approach is first at depth and then in the machining plane.
Spatial approach:
Approach is at depth and in machining plane simultaneously.
Retraction is performed in reverse order.
Mixed programming is possible, for example, approach in the machining plane, retract
spatially.
Path milling along center-point path.
A programmed contour can also be machined along the center-point path if the radius
correction was switched-out. In this case, approaching and retraction is only possible along a
straight line or vertical. Vertical approach/retraction can be used for closed contours, for
example.
Procedure
1. The part program or ShopMill program to be processed has been created
and you are in the editor.
2. Press the "Contour milling" and "Path milling" softkeys.
The "Path Milling" input window opens.
Programming technological functions (cycles)
10.3 Contour milling
Milling
Operating Manual, 08/2018, 6FC5398-7CP41-0BA0 493

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Siemens SINUMERIK ONE MCP 2400.4c Specifications

General IconGeneral
BrandSiemens
ModelSINUMERIK ONE MCP 2400.4c
CategoryControl Systems
LanguageEnglish

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