EasyManua.ls Logo

GE E-CELL STACK MK-2 Series - Cleaning Procedure 4: Hydrochloric Acid and Sodium Chloride; Sodium Hydroxide Cleaning;Sanitizing; Cleaning Procedure 5: Halane or Peracetic Acid Sanitizing; Cleaning Procedure 6: Hydrochloric Acid and Halane or Peracetic Acid Sanitizing; Cleaning Procedure 7: Halane or Peracetic Acid Sanitizing and High Ph Sanitizing

GE E-CELL STACK MK-2 Series
31 pages
Print Icon
To Next Page IconTo Next Page
To Next Page IconTo Next Page
To Previous Page IconTo Previous Page
To Previous Page IconTo Previous Page
Loading...
rev.1.1 Page 11-28
Cleaning Procedure 4: Hydrochloric
Acid and Sodium Chloride / Sodium
Hydroxide Cleaning/Sanitizing
Cleaning Procedure 5: Halane or
Peracetic Acid Sanitizing
This procedure provides an acid cleaning of all
chambers of the Stacks to remove inorganic
metallic scale.
Sodium chloride 5% / sodium hydroxide 1% is
useful for cleaning fouling due to organics or to
biological growth, and for sanitization. It can
also clean light silica scaling.
Halane, a widely used source of chlorine, is
useful for cleaning and sanitizing high-purity
water treatment equipment. Peracetic acid
0.04% / hydrogen peroxide 0.2% performs
similarly using a different chemical species. Due
to their oxidizing power, these cleaning solutions
should be used infrequently.
Steps Steps
Cleaning Setup Cleaning Setup
Instruction 1 Instruction 5
Instruction 6 Instruction 6
Instruction 2
Instruction 3 or Instruction 4 (NOT BOTH)
Instruction 7 Instruction 5
Instruction 7
Cleaning Procedure 6: Hydrochloric
Acid and Halane or Peracetic Acid
Sanitizing
Cleaning Procedure 7: Halane or
Peracetic Acid Sanitizing and High pH
Sanitizing
Where hardness or other metallic scale is present
along with heavy biological fouling an acid
cleaning step is added to the beginning of the
procedure.
Halane, a widely used source of chlorine, is useful
for cleaning and sanitizing high-purity water
treatment equipment. Peracetic acid 0.04% /
hydrogen peroxide 0.2% performs similarly using
a different chemical species. Due to their
oxidizing power, these cleaning solutions should
be used infrequently.
Halane, a widely used source of chlorine, is useful
for cleaning and sanitizing high-purity water
treatment equipment. Peracetic acid 0.04% /
hydrogen peroxide 0.2% performs similarly using
a different chemical species. Due to their
oxidizing power, these cleaning solutions should
be used infrequently.
For severe biological fouling a high pH step is
added to the procedure for improved efficiency.
Steps Steps
Cleaning Setup Cleaning Setup
Instruction 1 Instruction 5
Instruction 6 Instruction 6
Instruction 5
Instruction 3 or Instruction 4 (NOT BOTH)
Instruction 6 Instruction 2
Instruction 3 or Instruction 4 (NOT BOTH)
Instruction 7
Instruction 5
Instruction 7

Table of Contents

Related product manuals