Introduction
16 Agilent 5800 and 5900 ICP-OES User's Guide
An extensive Help and Learning Center containing context-sensitive Help with
information on how to set up methods and run instrument tests, hardware
basics and maintenance videos, step-by-step instructions for frequently
performed operations and instructions for using any accessories you ordered.
Conventions
The following conventions have been used throughout the documentation:
Menu items, menu options and field names (for example, click Copy from the
Edit menu) have been typed in bold. Bold is also used to signify the buttons
appearing throughout the software (e.g., click OK).
ALL CAPITALS indicate keyboard commands (e.g., press the F2 key) and text
you must type in from the keyboard (e.g., type SETUP at the prompt).
Notes and tips
A Note is used to give advice or information.
A Tip is used to give practical hints to help you achieve the best possible
performance from your ICP-OES.
ICP-OES Argon Gas Supply
Table 1. Typical flow rates for the Agilent ICP-OES instruments
Typical Flows Argon (with nitrogen purge gas)
Measuring wavelengths
> 189 nm (poly boost off)
Argon flow 16.7 L/min
Nitrogen flow 0.8 L/min
Measuring wavelengths
< 189 nm (poly boost on)
Argon flow 16.7 L/min
Nitrogen flow 4.4 L/min
Argon can be used as a plasma gas and purge gas which results in a higher total
argon flow rate.
The user (or other authorized personnel) must carry out appropriate leak tests
necessary to ensure safety on the gas and liquid connections that the operator is
directed to assemble during installation, normal use or maintenance.
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