Installation Data Oxford Instruments Plasma Technology PlasmalabSystem100
Installation Data (PECVD - TEOS)
Printed: 10-Feb-11, 9:07 Page 3 of 24 Issue 10: February 11
1. Introduction
This installation specification document gives information about the PlasmalabSystem100
to
enable customers to prepare the required environment for the system.
Note that all dimensions shown in these data sheets are typical; precise dimensions
depend on the actual equipment fit. All dimensions are given in millimetres unless
otherwise stated.
All information, services, dimensions etc., refer only to the
PlasmalabSystem100, i.e. plasma processing at up to 200 mm wafers in
MESC compatible chambers.
Consider access when planning the system installation. Ensure that good access is
available to parts of the system that require maintenance. Ensure that all isolation points
for the system services are easily accessible.
Oxford Instruments Plasma Technology conducts a programme of continual product
development, and reserves the right to change the design and/or specification of
equipment without notice. The details contained in this document were correct at the
time of printing but should be confirmed immediately prior to delivery. Details of the
clean room interface will be advised at the time of delivery.
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