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Details system dimensions and component layouts as shown in figures, referencing specific diagrams for gas handling and pods.
Lists typical weights for various system components like frames, gas pods, and ovens for handling and installation planning.
Specifies the typical operating and passive heat load of the system and lists heat loads for compatible chillers.
Illustrates the PECVD services panel layout with connection types, sizes, and distances for installation.
Details voltage, current, frequency, and phase requirements for 208V and 415V system electrical supplies.
Outlines flow and temperature parameters for water cooling connections for turbo, LF generator, AMU, and load lock.
Specifies flow and temperature requirements for the liquid controlled top electrode cooling system.
Defines flow and pressure specifications for system CDA and gas pod CDA.
Details flow and pressure requirements for system N2 supply and rotary pump purging.
Specifies pressure requirements for process gas inlets, including connection types and materials.
Outlines flow rate requirements for gas pod and TEOS pod extraction, and references pump set information.
Presents a table of available rotary vane and Roots pumps with dimensions, connections, weight, cooling, power, and N2 purge rates.
Lists available pumps for loadlock and wafer-handler systems with their specifications and N2 purge recommendations.
Details specifications, dimensions, water connections, electrical requirements, and performance graphs for various chiller models.
Explains the 24Vdc interlock chain function, its monitoring, and conditions required to enable RF power and process gases.
Provides a detailed table of interlocks, devices, PCB inputs, and comments for the RF enable chain.
Describes the gas box interlock chain and provides a table of incompatible gas types and their combinations.
General| Brand | Oxford Instruments |
|---|---|
| Model | PlasmalabSystem100 |
| Category | Laboratory Equipment |
| Language | English |
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