NANYTE BEAM Manual
NANYTE BEAM Manual BM-001-A3 / V1.1a Page 7 of 33
Powerful.
Sub-micron resolution while exposing a write field in less than two seconds.
Ultrafast autofocus.
Piezo actuators reach focus in less than a second when combined with our closed-looped focus
optics.
No-fuss multilayer.
Semi-automatic alignment allows multilayer alignment to be completed within minutes.
The BEAM ENGINE focuses a UV laser beam into a diffraction-limited spot and scans the spot to
expose any arbitrary pattern on a photoresist. To expose large wafers, precision steppers move
the wafer and allows multiple exposures to be stitched. The Beam Engine is capable of producing
features smaller than (CD) 0.8 µm across a 5” wafer.
A h-line laser light source is used and is compatible with a wide range of resists. The BEAM
ENGINE can be upgraded to use other light sources. Please contact your local representative for
this upgrade.
Below are some samples patterned with NANYTE BEAM.
50 µm
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