NANYTE BEAM Manual
NANYTE BEAM Manual BM-001-A3 / V1.1a Page 27 of 33
5. After the alignment process, please check the alignment quality by right clicking on
obvious features on the preview window, and ensure that the BEAM ENGINE moves to the
corresponding location. The feature should be located within the small black square in the
middle of the camera window. For reference the black square is 2.5 um wide.
Exposure
1. Ensure that the correct UV expose power is used. You can access this setting on the main
window. The value corresponds to mJ/cm
2
.
2. Click the slice button to generate the toolpath for NANYTE BEAM. For simple exposures,
this process should take less than a second. For complex exposures, a loading bar will
appear and the number of write fields that have been processed compared to the total
write fields will show.
3. Click the expose button to start the exposure. As soon as a write field is exposed, its color
on the preview window will turn red. During exposure, the expose button turns green and
returns to gray once the exposure is complete. Clicking the expose button during exposure.
at this point will immediately stop the exposure.
4. Enjoy the laser light show!
Sample Retrieval
1. Move the stage towards you for easier retrieval by pressing the ‘W’ key. Once the sample
is clear of the objectives, remove it gently with a pair of tweezers.
2. Follow the photoresist manufacturer’s guideline on development. For AZ5214E, one of
the most commonly used photoresist, we recommend using the AZ 351B developer in a
5:1 ratio for high contrast.
3. After the development process, the substrate can be loaded into NANYTE BEAM to
check if the development is done properly.
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