moved. If one focus height is often used, the set screw can be tightened to reduce the chance
of inadvertent slipping.
F. Close the Set Up>Raw Signal… dialog box. Focusing is now complete.
* * Note * * When performing the baseline procedure, always make sure the top sur-
face of the reference material is at the same height as the sample surface you intend to
measure.
There is also a video demonstration of this procedure on YouTube, which can be found here. An
active internet connection will be needed to view the video.
Measuring Thickness
Examples that describe the most common measurement setups are described in this section.
Example 1: Thickness of Films Greater Than ½ Micron Thick
Example 2: Thickness of Films Less Than ½ Micron Thick on Thick Transparent Sub-
strates
Example 3: Thickness of Films Less Than ½ Micron on Thin Transparent Substrates
Example 4: Transmittance Measurements
Example #1: Thickness of Films Greater Than ½ Micron Thick: SiO2 on
Silicon
For this example we will demonstrate only the measurement of SiO2 on silicon (the SiO2 on Sil-
icon Test Sample provided with the F20 may be used), but this type of measurement has an
extremely broad range of applications, including hardcoats, polysilicon, and LCD cell gaps, to
name just a few.
Hardware:
If the sample to be measured is flat, any standard or rotating sample stage will work fine. If the sam-
ple is curved, or is transparent with films on its backside (such as ophthalmic lens applications), a
hand-held contact probe measurement device (e.g., Part# CP-1) may be necessary.
Step 1: Select the film recipe
Select the film structure to be measured, in this case “SiO2 on Si”, from the Recipe: list box on the
main screen. If the structure to be measured does not exist, a new structure must be defined. See
Editing Film Recipe for more details.
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