General
Device concept
Plasma power source BIAS 300 Plasma
The BIAS 300 Plasma power source
with rapid overcurrent cut-out is a
completely digitised, microprocessor-
controlled inverter power source.
The modular design and potential for
system add-ons ensure a high degree
of flexibility. The BIAS 300 Plasma
power source can be adapted to any
specific situation.
Functional
principle
The central control and regulation unit of the power source is coupled with a di-
gital signal processor. The central control and regulation unit and signal proces-
sor control the entire plasma process.
During the plasma process, the actual data is measured continuously and the de-
vice responds immediately to any changes. The control algorithms developed by
the manufacturer ensure that the specified target status is maintained.
This results in:
-
a precise plasma process,
-
exact reproducibility of all results
-
excellent operating properties
Application are-
as
The BIAS 300 Plasma can be used for numerous plasma processes for which a
constant power supply is required.
Options BIAS 300 Plasma analog interface
for analog connection to a plasma system
BIAS 300 Plasma Profibus interface
for connection to a plasma system via Profibus
Slave interface BIAS 300 Plasma
for configuring a power source as a slave power source for increased power re-
quirement > 10 kW (incl. LHSB cable and Arc bus cable)
Multi-contact plug 60 A
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