DSolvent Considerations
84 July 7, 2014, 715003736IVD Rev. C
Solvents to avoid
Avoid these solvents:
•Solvents that contain halogens: chlorine, fluorine, bromine, or
iodine.
•Strong acids. (Use them only in weak concentration, less than 5%,
unless using them as cleaning agents. Avoid using acids as mobile
phases when their pH is less than 2.0.)
•Solutions that contain strong concentrations (greater than 0.1% wt.)
of complexing agents like ethylenediaminetetraacetic acid (EDTA).
•Compounds that form peroxides, such as UV-grade ethers, dioxane,
and diisopropylether.
Recommended additives/modifiers
• ≤0.3% vol. acetic acid
• ≤50 mM ammonium acetate
• ≤10 mM ammonium bicarbonate
• ≤50 mM ammonium hydroxide
• ≤0.1% wt. ethylenediaminetetraacetic acid (EDTA)
• ≤0.2% vol. formic acid
• ≤0.1% vol. heptafluorobutyric acid
•1% to 4% aqueous solutions of hexafluoroisopropanol (HFIP) for
oligonucleotide applications
• ≤10 mM phosphate buffer
• ≤0.1% vol. triethyl amine (TEA)
• ≤0.1% vol. trifluoroacetic acid (TFA)
Warning: To avoid contact with corrosive material that can be
present on instrument components HFIP damages, do not use
HFIP in wash solvents.
Caution: To avoid damaging the instrument, do not use HFIP in
wash solvents.
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