Endress+Hauser Analytik Jena PlasmaQuant MS - Method optimization

PlasmaQuant MS product family Method optimization
75
8 Method optimization
Method optimization is used to fine-tune the plasma and ion optics settings, including
the gas flows, sampling pump rate, sampling depth, and RF power settings for the
plasma, as well as the voltages applied to the ion optics. iCRC gas settings for the
interference management can also be modified.
All of these settings influence important performance attributes such as sensitivity,
interferences, noise, and background levels.
Method optimization is part of a regular "tune up" routine, which is required
periodically during normal operation, especially after maintenance has been
performed or consumables have been replaced.
The topics covered for method optimization are:
 Instrument initialization and solution preparations
 Manual optimization
 Automatic optimization
 Method optimization troubleshooting
The PlasmaQuant MS is designed for ease of use, with system operations fully
controlled by the ASpect MS software. The system can be tuned to suit each individual
application simply by adjusting the method parameters through the software,
manually or automatically. The auto tuning routines included in the software provide
fully-automated optimization of all ion optics parameters (except Pole Bias).
The following analytical performances have been specified for the four models of
PlasmaQuant MS product family:
Summary 12 Performance: PlasmaQuant MS, PlasmaQuant MS Q
Element Sensitivity
PlasmaQuant MS PlasmaQuant MS Q
Tuning solution Be, Mg, Co, Ba, Ce, In, Pb 1 µg/L 1 µg/L
Sensitivity
9
Be >2,0 ∙ 10
4
c/s >2,5 ∙ 10
4
c/s
115
In >0,5 ∙ 10
6
c/s >0,8 ∙ 10
6
c/s
208
Pb >2,25 ∙ 10
5
c/s >3,15 ∙ 10
5
c/s
232
Th (without AMR option) >0,3 ∙ 10
6
c/s >0,5 ∙ 10
6
c/s
Doubly-charged ratio
138
Ba
++
/
138
Ba
+
<3 % <3 %
Oxide ratio
140
Ce
16
O/
140
Ce <2 % <2 %
Background m/z = 5 <0,5 c/s <0,7 c/s