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Waters ACQUITY UPLC M-Class - D.2.4.5 Cleaning the system

Waters ACQUITY UPLC M-Class
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D.2.4.5 Cleaning the system
Cleaning the system kills and removes any residual bacteria present in the system. Clean the
system before performing an operation using neutral or basic mobile phase (or if you encounter
problems associated with neutral or basic mobile phase operation).
Requirement: You must clean the entire fluidic path that is exposed to high pH solvent.
Tips:
If the system uses multiple solvent managers, clean only the solvent manager exposed to
high pH solvent.
You can clean the µBSM and sample manager simultaneously, providing the sample manager
valve remains in the Load position. This ensures that the fluidic paths remain separate.
Start cleaning upstream and work down to avoid re-contaminating any areas.
D.2.4.5.1 Cleaning the solvent manager
Required materials
MS-grade isopropanol
LC/MS-grade water
Note: Obtain the following if applicable:
iKey Infusion device
Union
Wrenches for the M-detail and V-detail fittings
Requirement: It is important to direct µBSM and ASM outlets to waste during this procedure.
Divert waste lines from the vent valve to waste.
Prerequisite: Before performing this procedure, determine the path of the high pH solvent
through the system. This path is used as a waste path and flushed concurrently during this
procedure. See Flushing the high pH fluidic path for example systems.
To clean a system with a µBSM or ASM:
1. If cleaning an ionKey/MS system, replace your iKey separation device with an iKey
Infusion device.
2. If applicable, remove the columns in the high pH fluidic path, such as a trap column, from
the system and replace them with a union.
3. Mix a solution of 70% isopropyl alcohol and 30% LC/MS-grade water.
Note: 70% isopropyl alcohol is more lethal to bacteria than 100% isopropyl alcohol.
4. Verify that any valves in the high pH fluidic path are in a position that allows the solvent to
flow to waste. Divert waste lines from the vent valve to waste.
November 26, 2019, 715003588 Revision C
Page 107

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