SUSS MicroTec MJB4 - First Exposure of Substrate; Set the Exposure Values; Loading the Mask; Loading the Substrate

OPERATION OF THE MJB4
28 MJB4 - Operation Rev02 01-06
3
3.4. First Exposure of Sub-
strate
No adjustment is necessary for the first exposure of
the substrate. With the machine in its initial state, the
following procedure steps are required:
3.4.1. Set the Exposure Values
See section 1.3.3. "Setting Exposure Values".
3.4.2. Loading the Mask
See section 1.3.5. "Loading the Mask".
WARNING:
In order for all the processes to start,
the MAIN MENU must be selected and
the contact lever must be pressed!
3.4.3. Loading the Substrate
See section 1.3.6. "Loading the Substrate".
Press this button to display a description of the
individual procedure steps including wedge error
compensation.
– Load the mask holder with the mask,
– Pull out the slide and load the chuck,
– Place the substrate on the chuck,
– Completely insert the slide,
– Raise the substrate with the contact lever.
Experienced operators can use the contact lever
without first selecting the LOAD SUBSTRATE
button.
Exposure
The substrate is in the exposure position after WEC
is complete. For the contact exposure types, all
program steps down to the exposure are performed
automatically.
If a distance exposure is carried out, the separation
lever must be pulled back before the exposure.
After the exposure, shift the lever to move the
substrate down for unloading.
The exposure unit moves by approx.
150 mm in the direction of the operator.
Unloading the Mask
To release the mask holder, remove both screws on
the right side of the mask holder frame. Take out the
mask holder and place it on a tray upside down.
Switch off the mask vacuum by pressing the
MASKVACUUM IS ON button.
The mask can now be removed.