Foreword
MJB4 - Foreword Rev02 01-06
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Foreword
The MJB4 Mask Aligner is a precision instrument for high-resolution photolithography
and is intended for use in research laboratories, small-series production and pilot
projects.
The flexibility of the MJB4 is unsurpassed when exposing standard wafers and
substrates and irregularly shaped substrates with a diameter of up to 100 mm or 4"x 4"
and various thicknesses.
The MJB4 Mask Aligner is a state-of-the-art instrument. The MJB4 combines proven
and newly developed technology for adjusting wafers, fragments of wafers and
substrates.
Different versions of the aligner are available.
A single-field microscope and a split-field microscope, which can also be equipped with
an optional video system, are available for adjusting the top side. IR adjustment is
available for both microscopes.
These microscopes were developed from the successful SUSS MJB3 Mask Aligners,
which were the international leaders among these types of instruments for over 3
decades.
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