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ME12058B
Maintenance Section
15.7 XRR/XRD Measurement
Troubles Causes and remedies
The measurement profile
intensity is extremely high.
Check to make sure that the slit setting in the recipe.
The measurement profile
intensity is extremely low.
Check to make sure that the sample alignment is conducted
properly.
In the sample alignment conducted prior to the XRR
measurement, observe the scan profile of ω-axis and make
sure that there is no abnormality.
Check to make sure that the surface/interface roughness is not
excessive.
If the surface/interface roughness is excessive (several nm or
larger), the reflection intensity decreases rapidly, disallowing
the observation of oscillations according to film thickness.
The critical angle cannot be
fitted.
Check to make sure that the curvature of the sample is not too
large.
If the curvature of the sample is too large, conduct the sample
alignment using the auto focus.
In that case, make sure that the ω scan alignment is
appropriate.
Alignment of the critical angle of Si can be achieved by
setting the 2θ offset (2θ0).
Analysis cannot be performed
properly.
Refer to the analysis know-how section in the analysis
software manual.
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