OPERATION OF THE MJB4
MJB4 - Operation Rev07 05-10 29
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Clamp down the black lever on the setting knob to
prevent it from rotating any further.
The contact lever must be pulled back in order to
return to the Main menu.
3.4.8. Wedge Error Compensation
Pressure
For wedge error compensation (WEC), the substrate
must be pushed against the mask with a defined
amount of force. The WEC pressure is used to
compensate for the greater weight of a large chuck.
The WEC pressure must also be proportionally
adjusted to the substrate surface. The pressure for
wedge error compensation can be set to meet
specific process requirements (value between 0.0
and max. 2.0 [bar]). This can be done using the
WEC PRESSURE setting knob.
The set value is indicated at the gauge above the
setting knob.
3.4.9. Wedge Error Compensation
(WEC)
The WEC is performed manually.
To perform WEC using the contact lever, the
separation lever must be in contact position. The
substrate is moved against the mask with the
previously set pressure (section 3.4.8) and WEC is
performed. The mask and substrate are now
completely parallel to each other.
After the WEC head stops, the separation lever must
be moved to the “alignment distance” position in
order to perform an alignment.
Caution!
No alignment must be done if the mask
and substrate are in contact.
Doing so may damage the mask and
substrate!
3.5. Substrate Alignment with
the Top Side Microscope
With this mode the substrate is adjusted using the
TSA microscope. The following example explains
the necessary steps for adjustment and exposure
with manual mask loading, soft contact exposure
and wedge error compensation in contact mode.
With the machine in its initial state, the following
procedure steps must be carried out:
3.5.1. Setting the Exposure Values
See section 3.4.3. "Setting the Parameters".
3.5.2. Loading the Mask
See section 3.4.5. "Loading the Mask".
Attention!
In order for all the processes to start,
the Main menu must be selected and
the contact lever must be moved!
3.5.3. Loading the Substrate
See section 3.4.6. "Loading the Substrate".
Caution!
The microscope pivots downwards!
Setting the Separation Lever to the Alignment
Position
Never align the substrate if the mask
and substrate are in contact! Doing so
will damage the mask and substrate.
The display shows the page: „Align substrate...“
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