OPERATION OF THE MJB4
MJB4 - Operation Rev07 05-10 31
3
3.5.6. Exposure
Once the substrate is aligned and brought to the
exposure position using the SEPARATION LEVER,
press the Expose button to perform the exposure.
You must press additionally Yes on the display to
confirm the exposure.
Screen page: Exposure
If you press NO or use the CONTACT or
SEPARATION LEVER, the shutter keeps closed.
The substrate can now be unloaded or readjusted.
After pressing Yes the shutter will be opened for the
programmed exposure time.
Caution!
Microscope in motion!
3.5.7. Unloading the Mask
To release the mask holder, remove both screws on
the right side of the mask holder frame. Take out the
mask holder and place it on a tray upside down.
Switch off the mask vacuum by pressing the Mask
vacuum is on button.
The mask can now be removed.
3.6. Substrate Alignment with
IR Illumination
For IR substrate alignment, special IR cameras p/n
186259 and special IR lenses are required for the
opaque area.
The following example explains the necessary steps
for IR alignment and exposure with manual mask
loading, soft contact exposure and wedge error
compensation in contact mode. With the machine in
its initial state, the following procedure steps must
be carried out:
3.6.1. Incident Light
The M500 microscope must only be used for IR
transmission light, and the M604 microscope
requires a special IR filter slide. The option IR
transm. light is selected within the Parameters
menu.
3.6.1.1. Setting the Exposure Values
See section 3.4.3. "Setting the Parameters".
3.6.1.2. Loading the Mask
See section 3.4.5. "Loading the Mask".
Attention!
In order for all the processes to start,
the Main menu must be selected and
the contact lever must be moved!
3.6.1.3. Loading the Substrate
See section 3.4.6. "Loading the Substrate".
Caution!
The microscope pivots downward!
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