PREFACE
MJB4 - PREFACE Rev06 10-09 a
PREFACE
The MJB4 Mask Aligner is a precision instrument for
high-resolution photolithography and is intended for
use in research laboratories, small-series production
and pilot projects.
The flexibility of the MJB4 is unsurpassed when
exposing standard wafers and substrates and
irregularly shaped substrates with a diameter of up
to 100 mm or 4"x 4" and various thicknesses.
The MJB4 Mask Aligner is a state-of-the-art
instrument. The MJB4 combines proven and newly
developed technology for adjusting wafers,
fragments of wafers and substrates.
Different versions of the aligner are available.
A single field microscope and a splitfield
microscope, which can also be equipped with an
optional video system, are available for adjusting the
top side. IR adjustment is available for both
microscopes.
These microscopes were developed from the
successful SUSS MJB3 Mask Aligners, which were
the international leaders among these types of
instruments for over 3 decades.
To Next Page
Loading...
