GEN1000 Operator Manual
42 July 22, 2019 | 287960-ENG | R00
5.10 Additive Carbon Dioxide Control – CO
2
Option
The Carbon Dioxide control option provides additive control of CO
2
. It includes a sensor
connected to the control system and a solenoid controlled injection system to elevate CO
2
levels
in the chamber.
The level of CO
2
in the chamber is displayed in parts per million (ppm) on the control screen and
is programmed the same way as temperature and humidity. CO
2
is monitored continuously as
long as the control system is active.
5.10.1 Set up the Additive CO
2
Control
CO
2
control requires a high-pressure and a low-pressure regulator. In most chambers, the low-
pressure regulator and the solenoid assembly are located above in the machine compartment
and are factory set at 2 pounds per square inch (psi).
The high-pressure regulator is located on the customer-supplied CO
2
line. This regulator comes
in two styles of flow meters, a dial gauge or a glass tube and ball style. In North America,
Conviron provides the high-pressure regulator. Outside North America, the customer supplies
the high-pressure regulator due to different thread sizes on the CO
2
line.
5.10.2 Adjust the CO
2
Control
There are two variables to consider: programming desired CO
2
concentration and control of air
flow through the chamber.
Programming the CO
2
setpoint is as easy as programming temperature or relative humidity.
Values are entered in parts per million in the CO
2
zone on the Main Status Program Screen of
the control system. The Vaisala™ CO
2
monitor operates in two ranges, up to 2000 ppm and up
to 3000 ppm.
Ambient CO
2
levels are usually at least 350 ppm and can be higher, depending on proximity to
other CO
2
sources such as human beings or automobiles. The CO
2
concentration in the
Do not adjust this setting.
Do not adjust the regulator on the CO
2
tank once it has been set up.
Close the main valve on the CO
2
tank when it’s not in use.
Customized ranges are available upon written request. Contact Conviron for more
information.