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6.7.1. Heating the reservoirs
The reservoirs - except for the fluorine precursor (XeF2) - are heated in order to liberate the pro-
cess gases from the precursor substances and to improve their reactivity.
The fluorine precursor (XeF2) is never heated, but cooled, because this substance is volatile at
room temperature.
Procedure
1 Open the Panel Configuration Bar.
2 Double-click Gas Injection System.
The Gas Injection System panel opens.
3 Activate the Reservoir checkbox of the precursor you wish to work with.
The Capillary checkbox is activated automatically.
It is recommended that the heating remains switched on all the time to ensure stable conditions,
because it can last some time until the optimum working temperature is achieved.
The temperature should be adjusted in a way, that - when opening the respective reservoir valve
- the system vacuum is about 1 - 2 x 10
-5
mbar.
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