Zeiss Crossbeam 340 - Depositing or Etching with the Electron Beam

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6.7.2. Depositing or etching with the electron beam
CAUTION
Danger of damaging GIS micro stage or specimen.
Make sure to position the specimen surface at a safe working distance.
Procedure
1 Open the Panel Configuration Bar.
2 Double-click E-Beam Deposition and Etch.
The E-Beam Deposition and Etch panel
opens.
A deposition object is shown in the image
area.
3 Resize the deposition object to the appropriate
size.
4 Select the required precursor.
5Set a Gas Wait Time.
6Set a Total Duration Time.
7Set a Scan Rate.
8 Click Start.