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6.8.2. Gas assisted deposition: Platinum (with GIS upgrade only)
Requires FIB column and GIS.
A common ion-beam induced deposition is the deposition of platinum, which serves e.g. as a sur-
face protection layer. This section summarizes the procedure for the platinum depsition as a mod-
el.
IMPORTANT
For details on the deposition of other materials, refer to the Software Manual SmartSEM
®
XB.
Preconditions
• Workstation has been prepared
• Stage is tilted to 54°
6.8.2.1. Heating the platinum reservoir
Procedure
1 Heat the precursor:
a In the FIB Control panel, select the GIS
tab.
b Activate the Reservoir checkbox of Plati-
num.
The Capillary checkbox is activated auto-
matically.
There is a temperature gradient between reservoir (lowest temperature), capillary and nozzle
(highest temperature). This will guarantee that substances will not have the chance to condense
in any part of the gas line.
IMPORTANT
It is recommended to leave the precursor heaters always heated.
2 If required, initialise the GIS micro stage:
a In the GIS tab, click Stage Initialise.