9 Technical Data and Conformity | 9.4 Performance Data and Specifications | EVO 15 ZEISS
Parameter Requirement
Less than 42dB for frequencies from 200 up to 300Hz
Less than 50dB for frequencies higher than 300Hz
Electron Optics
Parameter Description
SEM resolution EVO column at optimum working distance:
SE detector, W or LaB₆ filament:
§ 3nm at 30kV with W
2nm at 30kV with LaB₆
§ 3.4nm at 30kV, VP mode
§ 20nm at 1kV with W
15nm at 1kV with LaB₆
§ 8nm at 3kV
HDBSD detector and beam deceleration, W or LaB₆ filament
§ 6nm at 3kV
Magnification Range: <7x – 1,000,000x referenced to Polaroid 5" × 4.5" image for-
mat
Electron source Filament: W or LaB₆
Field of View § Maximum 6mm diameter
at the analytical working distance (AWD) of 8.5mm
§ Maximum40 mm diameter
at the longest working distance
X-ray analysis 8.5mm AWD and 35° take-off angle
Optibeam modes Resolution, Depth, Analysis, Field, Fisheye
Image framestore 32768×24576 pixel, signal acquisition by pixel, line and frame inte-
gration and averaging, including drift compensated frame averaging
(limitations may apply to averaging mode and maximum scan speed
for large images)
System control SmartSEM user interface operated by mouse and keyboard
Windows 10 multilingual operating system
Specimen Chamber
and Stage
Parameter Description
Specimen chamber
dimensions
§ 310mm inner diameter
§ 220mm height
Analytical working
distance
8.5mm
Specimen stage Type: 5-axes motorized Cartesian controlled via the SmartSEM user
interface or operated by a dual joystick control box
Mounting: Drawer-type door
Movements:
§ X = 125mm
§ Y = 125mm
162 Instruction Manual ZEISS EVO | en-US | Rev. 10 | 354706-0780-006