1 Introduction
User Guide 1
The MLA150 is a high speed direct write lithography tool extended by capabilities
formerly only available on Mask Aligners. It can expose the patterns directly without
prior fabrication of a mask resulting in a significantly shorter prototyping cycle. It offers
topside alignment and backside alignment with high accuracy, and a light source which
generates sufficient dose to expose even thick and less sensitive resists. The MLA150
allows using substrates of any size and shape and provides flexible change of pattern,
distortion compensation and other software corrections. The system can produce
structures down to 1 µm. The alignment accuracy can be as good as 250 nm under
optimized conditions.
1.1 About this User Guide
This user guide gives information and instructions on how to handle the MLA150 system
properly. It is important that every person who intends to work with the system reads
this guide in order to avoid possible mishandling leading to damage to the system or to
persons. Therefore, by all means, read the safety instructions carefully before starting
work with the system. The guide assists the user in performing the exposure procedure
beginning at system startup and ending with the exposure procedure itself. The
subchapters in 6 Job Setup build a sequence of tasks that have to be executed in order
to prepare the exposure job.
Additionally, you find a description of the system and of the Exposure Wizard. Also
information about system utilities and troubleshooting are given in the final chapters.
Technical data can be found in the related document Technical Data Sheet
To facilitate following the instructions and information, a list of conventions indicating the
type of information is given here.
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