SUSS MA6 - Cleaning of Optical Parts; Deep UV Exposure

Operation of the Machine
MA6 / MA8 - 1. Operation of the Machine - Rev.05 07-06
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1.1.4.11 Cleaning of Optical Parts
Optical Components can degrade with time by dep-
osition of particles or fumes.
In this case they must be removed from the ma-
chine and cleaned very carefully, in order to recon-
stitute the original quality of the machine.
Optical surfaces are polished and/ or coated. Be-
cause of this they are extremely susceptible to me-
chanical damage. For cleaning they must not be
wiped, but only rinsed with liquid solvent.
No other solvent than DI-water (with or without mild
detergent) or IPA (Isopropyl alcohol) shall be used.
The choice between those depends on the charac
-
ter of contamination. The final cleaning step should
always use clear DI. If there is any doubt about the
adequate cleaning procedure call SUSS service.
See also instructions in the Maintenance chapter
and in the Preventive Maintenance Manual.
Caution!
To avoid damage on optical compo-
nents, use only recommended solvent
and do not wipe.
Place the part back to the identical po-
sition in the exposure optics system as
before
Warning!
When using IPO protect your skin
against contact with the solvent.
IPO is flammable, use it only away from
any ignition source. Do not spill IPO.
Used IPO and tissues soaked with IPO
must be deposited as flammable waste
following local regulations.
For details refer to the host interface documentation
delivered separately. This document describes the
GEM compliant SECS-II interface for the mentioned
equipment. It includes the information required by
the SECS-II and GEM standards including the GEM
State Models, SECS-II Message Documentation,
and other interface details.
1.1.4.12 Deep UV Exposure
Short-wave UV-light (<315nm) has a high biological
radiation effectivness and recommended maximum
dose for skin and eye exposure is very low.
Extended work in front of a laboratory mask aligner at
UV250 or UV300 optics can result in exceeding the
dose limit. Therefore it is recommended not to look to
the stray light, exiting from the mask stage during ex
-
posure and to keep unprotected hands away from
the stage during exposure.
Warning!
When using UV250 or UV300 then min-
imize eye-and skin- exposure from UV
stray light by increasing your distance
to the stage during exposure times.
SUSS MicroTec could also provide a
special stray light barrier to be placed
on top of the mask holder frame.