Preface
MA6 / MA8 - Preface - Rev.05 07-06
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Preface
The SUSS laboratory mask aligners are machines designed for photolithography applica-
tions in laboratories and for small-scale production. The MA6 and MA8 machines only differ
insignificantly in terms of operation.
Accordingly, the manuals for the mask aligners MA6 and MA8 have also been combined.
In this manual, minor differences are given special mention or are described by means of
specially identified pictures or sketches. Essentially, the differences relate to:
– machine dimensions, outline and weight
– travel path of the microscscope
– maximum size of the masks and substrates/wafers which are used
– changeover between mask aligner and bond aligner operation
(a detailed description is provided in BA6 Bond Aligner manual)
All of the tooling for the MA6 and MA8, e.g. chucks, mask holders and mask holder adapter
frames can be used on both mask aligners. Excepted from this are the BSA chucks for
BSA microscopes with split-field magnification. The BSA apertures are approx. 185mm
wide in a horizontal direction. This means that these chucks cannot be used on a standard
mask aligner with standard BSA microscopes.
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