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Endress+Hauser Cerabar M PMC51 - Oxygen Applications; PWIS Cleaning; Ultrapure Gas Applications (PMC51 und PMP51); Applications with Hydrogen

Endress+Hauser Cerabar M PMC51
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Cerabar M PMC51, PMP51, PMP55
42 Endress+Hauser
Use in hazardous area:
Intrinsically safe installations (Ex ia/IS)
FM/CSA IS: for Div.1 installation only
Oxygen applications
Oxygen and other gases can react explosively to oils, grease and plastics, such that, among other
things, the following precautions must be taken:
All components of the system, such as measuring devices, must be cleaned in accordance with the
BAM (DIN 19247) requirements.
Dependent on the materials used, a certain maximum temperature and a maximum pressure for
oxygen applications must not be exceeded.
The devices suitable for gaseous oxygen applications are listed in the following table with the
specification p
max
Order code for devices
1)
,
cleaned for oxygen applications
p
max
for oxygen applications T
max
for oxygen applications
PMC51
2)
– devices with sensors,
nominal value < 10 bar (150 psi)
Over pressure limit (OPL) of sensor
3)
4)
60 °C (140 °F)
PMC51 – devices with sensors,
nominal value ≥ 10 bar (150 psi)
40 bar (600 psi) 60 °C (140 °F)
PMP51 , PMP55
5)
Depends on the lowest-rated element, with regard to pressure, of the selected
components: over pressure limit (OPL) of sensor,process connection (1.5 x PN) or
fill fluid (160 bar (2 320 psi)
85 °C (185 °F)
1) Only device, not accessory or enclosed accessory
2) Product Configurator, "Service" ordering feature, option "HB"
3) Product Configurator, "Sensor range" ordering feature
4) PMC51 with PVDF thread or PVDF flange p
max
= 15 bar (225 psi)15 bar (225 psi)
5) Product Configurator, "Service" ordering feature, option "HB"
PWIS cleaning
Special cleaning of the transmitter to remove paint-wetting substances, for use in paint shops, for
instance.
Ordering information:
Ordering information: Product Configurator, "Service" ordering feature, option HC
The stability of the materials used must be checked before using them in the medium.
Ultrapure gas applications
(PMC51 und PMP51)
Endress+Hauser also provides devices which have been cleaned of oil and grease for special
applications, such as for ultrapure gas. No special restrictions regarding the process conditions apply
to these devices.
Ordering information:
Product Configurator, "Service" ordering feature, option "HA"
Applications with hydrogen
A ceramic process isolating diaphragm or a gold-plated metal process isolating diaphragm offers
universal protection against hydrogen diffusion, both in gas applications and in applications with
aqueous solutions.
Applications with hydrogen in aqueous solutions
Agold/rhodium-plated metal process isolating diaphragm (AU/Rh) offers effective protection
against hydrogen diffusion.

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