Chapter 8. Lithography
167
When the probe draws an object of the lithography template, the sample is applied to
pressure pulses of varied amplitude. The amplitude varies in a predefined range from A1 to
A2. Initial and final levels of the amplitude (A1 and A2) are defined in the fields Action 1
and Action 2 of the Control panel of the Litho window, respectively.
The Control panel of the Litho window contains a drop-down list for adjusting the pulse
shape and a field for adjusting the pusle duration t in ms (Fig. 8-4).
Time step is defined in the Step field of the Control panel of the Litho window.
8.1.2. Raster lithography
During a raster lithography process, the sample surface is exposed to pressure impacts at
points defined in a raster template. Levels of the applied force are proportional to
brightness of pixels in the template.
The template is taken from a graphics file of raster format.
To Next Page
Loading...