Solver NEXT SPM. Instruction Manual
124
Methods of improving image quality
When selecting the EFM mode, all parameters required for the second pass are set
automatically.
To achieve better quality of the images obtained, the values of the following parameters
can be varied during scanning:
∆Z separation between the probe and the surface during scanning in the
second pass. The greater ∆Z, the smaller influence of surface topography
on measurement results during the second pass. However sensitivity of
this technique decreases with higher separation. Set the desirable value of
elevation of the probe above the sample using the text box ∆Z.
Amp magnitude of the generator output signal. Decreasing the generator output
value and, respectively the probe oscillation amplitude, results in better
resolution for this technique. However, on the other hand, it reduces the
signal-to-noise ratio. To alter parameter Amp during scanning, open the
Block Scheme window. Set the desirable value of amplitude in the text
box Amp for MOD generator.
Bias Voltage alteration of the bias voltage sign and value can influence the behavior of
surface potentials in the second pass. To alter parameter Bias Voltage,
select the second-pass scanning Pass II. Set the desirable value of the bias
voltage in the text box BV.
Quality of the images obtained can be controlled from the 2D Scanning Data View panel
(Fig. 7-97).
All other settings and parameters alteration procedures during scanning are described in
detail in the SemiContact Mode of operations (i. “Scanning” on page 97).
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