EOS P 396 User Manual

Laser sintering process
2.7
Training manual • Basic training • Status 03.14
EOS P 396
2
Beam offset on exposure of the enclosed areas of the layer
During exposure of the enclosed areas of the layers, the beam offset displaces the
path of the centre of the laser beam from the nominal contour by the value entered
towards the inside.
Exposure types
The exposure types contain defined material and process parameters for the
exposure. Depending on the parameter settings, these types affect the mechanical
properties and the surface finish quality of the part, as well as the building speed. An
exposure type can be allocated to any part.
2
1
3
12
4
A
B
C
1 Actual contour (without beam offset)
2 Nominal contour (with beam offset)
3 Centre of the path of the laser beam
(exposure of enclosed area of the layer)
4 Centre of the path of the laser beam
(exposure of contour)
5 Beam offset
A Exposure of enclosed area of the layer
(without beam offset)
B Exposure of enclosed area of the layer
(with beam offset)
C Exposure of contour
(with beam offset)
For the different powder materials there are various exposure types defined by
EOS that are embedded in parameter sets.
See section 5, Exposure types for the original EOS parameter sets (without PPP),
Exposure types for the PPP parameter sets.
Using the Exposure editor module custom, customer-specific exposure types can
be prepared. See section 5, Exposure editor.

EOS P 396 Specifications

General

Brand	EOS
Model	P 396
Category	3D Printers
Language	English