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Log Comment
message field
Used to enter comments about the current process run which can be
viewed on the log viewer page.
Wafer status field
Displays context related messages about the currently loaded wafer.
Log Comment
button
Allows comments about the current process to be entered in the Log
Comment message field. While entering a comment, the button title
changes to OK to allow the comment to be accepted.
Return to
Process button
Select to return to the Chamber 1 process page.
Start button
Select to commence a leak detection test.
Stop button
Select to halt a leak detection test and return to pumping.
Step Time fields
Enter the required step time (in hours:minutes:seconds) for the
duration of the pressure-rise test. While a process is running, the
adjacent field displays the time remaining to the end of the step.
Log Interval
fields
Enter the sampling rate for the datalogging log file (in
hours:minutes:seconds).
If set to zero, no data log will be made.
Recipe message
field
Displays information about the current recipe, step, loaded wafer
identity etc.
PUMP TO TIME
fields
Click on the checkbox to select (9 Indicates selected) and then enter
the duration of the initial pumpdown (in hours:minutes:seconds). The
readback field displays the time remaining to the end of the test.
Pressure fields The pressures read by the chamber Penning and CM gauges are
displayed.
Mass Flow
Calibration
button
Select to calibrate the MFCs. Calibration is carried out by clicking on
each MFC mimic, then entering the Gas Name, Gas Factor and Mass
Flow. See sub-section 5.10.9, page 5-53.
Gas pod mimic
Displays a mimic of the gas lines.
Operating Instructions
Generic (OpAL Plasma) Issue 1: Oct. 07 Page 5-52 of 60 Printed: 06 November 2007 09:42
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