System Manual Oxford Instruments Plasma Technology OIPT Systems
6. Process gases
REGULATOR 0.5 BAR TO 5 BAR
(7 TO 75 PSIG) LOCATED
ADJACENT TO THE SYSTEM
SUPPLY TO
GAS POD
OR INTERNAL
GAS LINE
MINIMUM PRESSURE
3 BAR (45 PSIG)
ALL FITTINGS,
REGULATOR AND
FILTER TO BE
SEMICONDUCTOR
GRADE
ALL TUBING TO BE
ELECTROPOLISHED
STAINLESS STEEL
NOTES:
Fig 6.1: Recommended process gas supply installation
Semiconductor grade fittings and pressure regulators, together with electropolished
stainless steel tube must be used to ensure that gas quality is not degraded.
6.1 Mandatory specifications for process gas supplies
• Pipework fittings and pressure regulators: Semiconductor grade
• Gas handling tubing: Electropolished stainless steel
• Purity: At least 99.99% or higher to satisfy
process requirements.
• Filtration: A 2-micron filter is fitted to each gas
line supplied as part of the system.
For other grades of filter, please
consult OIPT.
• Regulation: 0.5 to 5 bar (7.5 to 75 psig)
• Minimum pressure at input to system: 2 bar (30 psig)
6.1.1 Systems using Helium wafer cooling
The specifications for the Helium gas supply are as for those of the process gases given
in sub-sections 6 and 6.1 with the exception that the maximum pressure at the inlet to
the pressure controller must not exceed 3.5 bar (43 psig). The design of the Helium
pressure controller is such that it can be destroyed by higher pressures.
Services Specifications
Printed: 6-Jan-10, 8:53 Page 15 of 22 Issue 21: January 10
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