System Manual Oxford Instruments Plasma Technology OpAL
3.11 94-100-6-46 ICP 65 source
The ICP 65 source is shown in Fig 3-29. RF power from the RF generator is fed via the
automatch unit to the RF coil to create a plasma within the insulating tube (under
vacuum). Process gas is supplied to the top of the insulating tube and to the gas ring
located within the process chamber. The screening box cover incorporates a NW40
pumping port to enable ozone removal. The cover is interlocked to prevent the
application of electrical / RF power whilst the cover is not in place.
WARNING
DO NOT POWER UP THE SYSTEM WITHOUT FIRST CONNECTING THE
NW40 PUMPING PORT TO AN EXTRACTION SYSTEM CAPABLE OF
PUMPING AT FIVE CUBIC METRES/HOUR.
Description
Printed: 07 August 2009 07:42 Page 3-33 of 46 Issue 1: August 07
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