OpAL Oxford Instruments Plasma Technology System Manual
3.7.2 Upper chamber configuration for thermal ALD
The upper chamber configuration for thermal ALD is shown in Fig 3-24 (based on
drawing G-MA71A29920).
This configuration comprises the following major components:
Chamber top cover incorporating a process gas inlet.
Process chamber top – forms the upper half of the process chamber and when lowered
onto the lower chamber provides a vacuum-tight process chamber. Sealing is provided by
integral O rings. Apertures are provided for the following:
Two blanked view ports – each can be used as a view port or to mount an end point
detection device.
Process gas line inlet.
Process gas valve
(if fitted)
Chamber top cover
(thermal)
O ring
O ring
Clamping
components
Clamping
components
Blank view port
components
Gas port assembly
Liner disk
Process
chamber top
Centering ring
Fig 3-24: Upper chamber configuration for thermal ALD
Description
Issue 1: August 07 Page 3-28 of 46 Printed: 07 August 2009 07:42
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