Oxford Instruments OpAL - Description

System Manual Oxford Instruments Plasma Technology OpAL
3 Description
3 Description ...................................................................................................... 3-1
3.1 Introduction .............................................................................................. 3-3
3.2 System component locations...................................................................... 3-4
3.2.1 Console/base unit mechanical assembly..................................................3-4
3.2.2 System views ...........................................................................................3-5
3.3 Hoist assembly ........................................................................................ 3-10
3.4 Control system ........................................................................................ 3-13
3.4.1 PC 2000 Hardware and software with licence .........................................3-13
3.4.2 System controller...................................................................................3-13
3.4.3 Control PLC (ALD valves)........................................................................3-15
3.4.4 Heating .................................................................................................3-16
3.4.4.1 Heater PLC ....................................................................................3-18
3.5 Controls and indicators............................................................................ 3-19
3.5.1 Base unit ...............................................................................................3-19
3.5.2 Precursor cabinet control panel..............................................................3-20
3.6 Emergency off and Interlock facilities....................................................... 3-20
3.6.1 Emergency off switch.............................................................................3-20
3.6.2 PLC interlock chain ................................................................................3-21
3.6.2.1 General description .......................................................................3-21
3.6.2.2 Gas pod interlocks ........................................................................3-23
3.6.2.3 Incompatible gases .......................................................................3-23
3.6.2.4 System Link Configuration Table ...................................................3-24
3.6.2.5 System LED Monitoring Table ........................................................3-24
3.7 Process chamber...................................................................................... 3-25
3.7.1 Upper chamber configuration for plasma ALD........................................3-26
3.7.2 Upper chamber configuration for thermal ALD .......................................3-28
3.7.3 Lower chamber configuration for plasma and thermal ALD ....................3-29
3.8 Lower Electrode ....................................................................................... 3-30
3.9 Vacuum system ....................................................................................... 3-31
3.10 System power supply ............................................................................... 3-32
3.11 94-100-6-46 ICP 65 source .................................................................... 3-33
3.12 Gas handling ........................................................................................... 3-35
3.12.1 Standard non-toxic gas line.................................................................3-35
3.12.2 Standard toxic gas line ........................................................................3-36
3.12.3 Internal gas pod ..................................................................................3-38
3.12.4 8-line gas pod.....................................................................................3-39
3.13 Precursor................................................................................................. 3-41
3.13.1 Water delivery......................................................................................3-43
3.13.2 Precursor Cabinet ................................................................................3-43
3.13.3 Precursor manufacturers......................................................................3-44
3.13.4 Bubbler connections ............................................................................3-45
3.13.5 Precursor consumption ........................................................................3-45
3.14 Glove box ................................................................................................ 3-46
3.15 Residual gas analyser............................................................................... 3-46
Fig 3-1: System frame..................................................................................................3-4
Fig 3-2: System front view ...........................................................................................3-5
Fig 3-3: System front view – front panel removed.........................................................3-6
Fig 3-4: Rear view of system ........................................................................................3-6
Fig 3-5: Console rear view (part) ..................................................................................3-7
Fig 3-6: Console left-hand side view............................................................................3-7
Fig 3-7: Console top front view....................................................................................3-8
Fig 3-8: Nitrogen vent line ...........................................................................................3-8
Fig 3-9: Console right-hand view.................................................................................3-9
Fig 3-10: Console right- hand view (door open)...........................................................3-9
Description
Printed: 07 August 2009 07:42 Page 3-1 of 46 Issue 1: August 07