Oxford Instruments OpAL - Lower Chamber Configuration for Plasma and Thermal ALD

System Manual Oxford Instruments Plasma Technology OpAL
3.7.3 Lower chamber configuration for plasma and thermal ALD
The lower chamber configuration for plasma and thermal ALD is shown in Fig 3-25
(based on drawing MA71A29232).
Lower chamber
liner
Heater
cartridge
Lower process
chamber
O ring
O ring
Adapter flange
(pumping line)
Thermocouple
leg
Heater
legs
Water in
for flange
cooling
Water out
for flange
cooling
Mounting
flange
Thermo
Switch
Fig 3-25: Lower chamber configuration for both thermal and plasma ALD
Description
Printed: 07 August 2009 07:42 Page 3-29 of 46 Issue 1: August 07