Case
Extension ApplicationNo FilingDate PublicationNo
ublication Dat
PatentNo Issue DateTitle Status Assgnee
MC.077 TW Low temperature WNC. TW 91120831 12-Sep-2002 559890 01-Nov-2003 189730 02-Mar-2004 ASMIIssued
MC.078 AUS Stuffed diffusion barrier US 10/007304 05-Dec-2001 2002/0187631 12-Dec-2002 6936535 30-Aug-2005 ASMIIssued
MC.078 JP Stuffed diffusion barrier JP 2002/566544 05-Dec-2001 2004/525510 19-Aug-2004 ASMIPublished
MC.078 KR Stuffed diffusion barrier KR 10/2000/0074 06-Dec-2000 2003/0386034 02-Jun-2003 0386034 02-Jun-2003 ASMIIssued
MC.078 PCT Stuffed diffusion barrier WO /US01/47592 05-Dec-2001 02067319 29-Aug-2002 ASMIPublished
MC.087 AUS Enhanced thermal conduction US 10/463309 16-Jun-2003 2003/0232138 18-Dec-2003 ASMIPublished
MC.087 VJP Enhanced thermal conduction JP 2003/171797 17-Jun-2003 2004/134741 30-Apr-2004 ASMIPublished
MC.087 VTW Enhanced thermal conduction TW 92116365 17-Jun-2003 2004/04912 01-Apr-2004 ASMIPublished
MC.094 AUS Source vapour pressure monitor US 10/285348 30-Oct-2002 2004/0083787 06-May-2004 6779378 24-Aug-2004 ASMIIssued
MC.094 JP Source vapour pressure monitor JP 2003/370625 30-Oct-2003 2004/149925 27-May-2004 ASMIPublished
MC.098 AUS Molecular bridges US 10/696244 28-Oct-2003 2004/0092096 13-May-2004 ASMIPublished
MC.098 PCT Molecular bridges WO 2003/033214 21-Oct-2003 2004/040642 13-May-2004 ASMIPublished
MC.108 AUS Adjusting electronegativities and work
function
US 10/430703 05-May-2003 2004/016261 03-Jun-2004 ASMIPublished
MC.108 JP Adjusting electronegativities and work
function
JP 2003/404434 03-Dec-2003 2004/186693 02-Jul-2004 ASMIPublished
MC.109 AUS Barrier layers for metal gates and electrodes US 10/430811 05-May-2003 2004/0104439 03-Jun-2004 6858524 22-Feb-2005 ASMIIssued
MC.110 AUS Enhanced CMOS process flow US 10/601037 19-Jun-2003 2004/0106249 03-Jun-2004 ASMIPublished
MC.145 AUS HfSiON with one reactor US 10/652851 29-Aug-2003 6818517 16-Nov-2004 ASMIIssued
Pa
e 13 of 13
M Patents Licensed / Sub-licensed to Oxford Instruments
Restricted Distribution
October 14, 2005