Oxford Instruments OpAL - Page 16

281ASM Patents Licensed / Sub-Licensed to Oxford Instruments
Case
Extension ApplicationNo FilingDate PublicationNo
P
ublication Dat
e
PatentNo Issue DateTitle Status Assgnee
g.002 KR Method for forming a metal film KR 1998/35911 01-Sep-1998 2000/18353 06-Apr-2000 332364 30-Mar-2002 ASMGIssued
g.004 EP Method for forming a three component
nitride film containing metal and silicon
EP 1999/941865 10-Sep-1999 1044288 18-Oct-2000 1044288 19-Mar-2003 ASMGPublished&
Gr
g.004 JP Method for forming a three component
nitride film containing metal and silicon
JP 1999/570818 10-Sep-1999 2002/525432 13-Aug-2002 ASMGPublished
g.004 US Method for forming a three component
nitride film containing metal and silicon
US 09/554443 10-Sep-1999 6426117 30-Jul-2002 ASMGIssued
g.004 WO Method for forming a three component
nitride film containing metal and silicon
WO PCT/KR98/4 10-Sep-1999 0016377 23-Mar-2003 ASMGPublished
g.009 EP Method of Forming a Thin Film EP 2000/915582 06-Apr-2000 1092233 18-Apr-2001 ASMGPublished
g.009 JP Method of Forming a Thin Film JP 2000/612991 06-Apr-2000 2003/521579 15-Jul-2003 ASMGPublished
g.009 KR Method of Forming a Thin Film KR 1999/11877 06-Apr-1999 2000/49298 05-Aug-2000 273473 15-Nov-2000 ASMGIssued
g.009 US Method of Forming a Thin Film US 09/719103 06-Apr-2000 6645574 11-Nov-2003 ASMGIssued
g.009 WO Method of Forming a Thin Film WO PCT/KR00/0 06-Apr-2000 0063957 26-Oct-2000 ASMGPublished
g.010 EP Chemical Deposition Reactor and Method
of Forming a Thin Film using the Same
EP 2000/940951 19-Jun-2000 1125321 22-Aug-2001 ASMGPublished
g.010 JP Chemical Deposition Reactor and Method
of Forming a Thin Film using the Same
JP 2000/505047 19-Jun-2000 2003/502501 21-Jan-2003 ASMGPublished
g.010 KR Chemical Deposition Reactor and Method
of Forming a Thin Film using the Same
KR 1999/23078 19-Jun-2000 2001/1007431 26-Jan-2001 ASMGPublished
g.010 US Chemical Deposition Reactor and Method
of Forming a Thin Film using the Same
US 09/763238 19-Jun-2000 6539891 01-Apr-2003 ASMGIssued
g.010 WO Chemical Deposition Reactor and Method
of Forming a Thin Film using the Same
WO PCT/KR00/0 19-Jun-2000 0079576 28-Dec-2000 ASMGPublished
g.015 EP Thin Film Forming Method EP 2001/937028 08-Jun-2000 1292970 19-Mar-2003 ASMGPublished
Pa
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e 1 of 13
S
M Patents Licensed / Sub-licensed to Oxford Instruments
Restricted Distribution
October 14, 2005