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For Health and Safety aspects of operating and maintaining the Oxford Instruments Plasma
Technology Automatch Unit, refer to Section 1 - Health and Safety of your mä~ëã~ä~Ä or
fçåÑ~Ä system manual.
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The purpose of the Oxford Instruments Plasma Technology Automatch Unit (AMU) is to match
the impedance of mä~ëã~ä~Ä process chambers and fçåÑ~Ä RF ion sources to RF generators
with an output impedance of 50 ohms, operating at 13.56 MHz.
DC bias / Peak-
to-peak switch
Fig 1: The Oxford Instruments Plasma Technology automatch unit
Different versions of internal components exist, but all AMUs in this series share common
electronic controls and setting up instructions. The main versions are:
Low power: The two matching capacitors are air-cooled vane types.
High power: The two matching capacitors are water-cooled vacuum types.
The low power version is used for single wafer electrodes matching up to 500W. (The air vane
AMU is rated for 300W operation in all OIPT tools, and for use up to 500W in specific builds.)
The high power version is used in most other applications, including batch electrode
matching, 3kW ICP source, and 3cm and 15cm RF ion sources.
Note that OIPT also manufactures a 5kW AMU for use with the ICP 380 source and the 35cm
RF ion source. This AMU has an associated dedicated manual.
OIPT Automatch Unit
Printed: 16-Nov-07, 9:26 Page 3 of 20 Issue 6: September 05
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