Oxford Instruments OpAL - Page 23

Case
Extension ApplicationNo FilingDate PublicationNo
P
ublication Dat
e
PatentNo Issue DateTitle Status Assgnee
MC.030 C1US Solid source for Pulsar™ US 10/695269 28-Oct-2003 2004/0086642 06-May-2004 ASMIPublished
MC.030 JP Solid source for Pulsar™ JP 2001/145256 15-May-2001 2001/323374 22-Nov-2001 ASMIPublished
MC.030 TW Solid source for Pulsar™ TW 89111644 14-Jun-2000 524875 21-Mar-2003 174786 24-Jul-2003 ASMIIssued
MC.031 AUS CVD of metalloid thin films US 09/764692 18-Jan-2001 2001/0009695 26-Jul-2001 6599572 29-Jul-2003 ASMIIssued
MC.031 C1US CVD of metalloid thin films US 10/394309 20-Mar-2003 2003/0186495 02-Oct-2003 6794287 21-Sep-2004 ASMIIssued
MC.033 AUS Liquid source system for ALD applications US 10/615332 08-Jul-2003 2004/0079286 29-Apr-2004 ASMIPublished
MC.033 VJP Liquid source system for ALD applications JP 2003/274331 14-Jul-2003 2004/36004 05-Feb-2004 ASMIPublished
MC.033 VTW Liquid source system for ALD applications TW 92118177 03-Jul-2002 2004/02774 16-Feb-2004 ASMIPublished
MC.035 AUS Active CVD-zone for ALD US 09/836674 16-Apr-2001 15-Aug-2002 ASMIPublished
MC.035 JP Active CVD-zone for ALD JP 2001/117413 16-Apr-2001 18-Dec-2001 ASMIPublished
MC.035 TW Active CVD-zone for ALD TW 89107028 14-Apr-2000 496907 01-Aug-2002 160775 27-Nov-2002 ASMIIssued
MC.036 AUS ALCVD™ reactor equipped with filter and
hot drain
US 09/835931 16-Apr-2001 2001/0054377 27-Dec-2001 6783590 31-Aug-2004 ASMIIssued
MC.036 FI ALCVD™ reactor equipped with filter and
hot drain
FI 20000900 14-Apr-2000 15-Oct-2001 ASMIPublished
MC.036 JP ALCVD™ reactor equipped with filter and
hot drain
JP 2001/117468 16-Apr-2001 09-Jan-2002 ASMIPublished
MC.036 KR ALCVD™ reactor equipped with filter and
hot drain
KR 10/2001/0020 14-Apr-2001 08-Nov-2001 ASMIPublished
MC.036 TW ALCVD™ reactor equipped with filter and
hot drain
TW 89107027 14-Apr-2000 576873 21-Feb-2004 197419 17-Jun-2004 ASMIPublished
MC.037 AUS CuO reduction / plasma radicals US 09/291807 14-Apr-1999 6342277 29-Jan-2002 6342277 29-Jan-2002 ASMIIssued
MC.037 C1US CuO reduction / plasma radicals US 09/974162 09-Oct-2001 2002/0031618 14-Mar-2002 6616986 09-Sep-2003 ASMIIssued
MC.037 C2 CuO reduction / plasma radicals US 10/683727 10-Oct-2003 2004/0076751 22-Apr-2004 ASMIPublished
MC.037 D1US CuO reduction / plasma radicals US 09/866156 24-May-2001 2001/0028924 11-Oct-2001 6652924 25-Nov-2003 ASMIIssued
MC.037 D2 CuO reduction / plasma radicals US 10/692243 22-Oct-2003 2004/0083949 06-May-2004 ASMIPublished
Pa
g
e 8 of 13
S
M Patents Licensed / Sub-licensed to Oxford Instruments
Restricted Distribution
October 14, 2005